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PRODUCT DESCRIPTION TYPE pH,
3% 20°C
TEMP, °C CONCENTRATION, % USAGE
siliron E™ Low foaming, glass substrate for flat panel display (FPD) Inorganic 11.5 11.5 Room Temp - 70°C 1-5 US, Dipping, Shower, Brush
siliron SA™ Low foaming, glass substrate for FPD; strong alkaline Inorganic 13.5 11.5 Room Temp - 60°C 1-5 US, Dipping, Shower, Brush
siliron IO™ Low foaming, glass substrate for FPD; non-nitrogen Inorganic 12.5 11.5 Room Temp - 60°C 1-5 US, Dipping, Shower, Brush
siliron RP™ Glass substrate for FPD; after-polishing cleaner Organic 12.5 11.5 Room Temp - 60°C 1-5 US, Dipping, Shower, Brush
siliron TKA™ Glass substrate for FPD; pre-cleaning of deposition Organic 12.5 45°C - 60°C 1-5 US, Dipping, Shower, Brush
siliron APX™ Neutral type; low damage to glass Neutral 8.5 40°C - 60°C 1-10 US, Dipping, Shower, Brush

PRODUCT DESCRIPTION TYPE pH TEMP, °C CONCENTRATION, % USAGE
poleve SH™ Edge stripper Organic 12 < Room Temp - 60°C 10 EDR
poleve HP2™ Edge stripper Organic 12 < Room Temp - 60°C 10 EDR
poleve HM™ Edge stripper Organic 12 < Room Temp - 60°C 10 EDR

PRODUCT DESCRIPTION TYPE pH TEMP, °C CONCENTRATION, % USAGE
disperse H™ Developer for negative-type photo resist, strong alkaline, standard color filter Inorganic > 12 Room Temp 1 Spray
disperse HA™ Developer for negative-type photo resist, strong alkaline, high-concentrate type, color filter Inorganic > 12 Room Temp 1 Spray
disperse HALF™ Developer for negative-type photo resist, strong alkaline, low-foaming, color filter, high-concentrate type Inorganic > 12 Room Temp 1 Spray
disperse JA™ Developer for negative-type photo resist, weak alkaline, color filter Inorganic 9-11 Room Temp 5 Spray
disperse K™ Developer for negative-type photo resist, weak alkaline, color filter Inorganic 9-11 Room Temp 5 Spray
disperse GRX™ Developer for negative-type photo resist, weak alkaline, high-concentrate type, color filter Inorganic 2.5 Room Temp 3 Spray
disperse DX™ Developer for negative-type photo resist, high concentrate, on array color filter Organic > 12 Room Temp 1 Spray
disperse CRM™ Developer for positive-type photo resist, standard Inorganic > 12 Room Temp 6 Spray
disperse S™ Developer for positive-type photo resist, preventing AI corrosion Inorganic > 12 Room Temp 50 Spray
disperse UT175™ Developer for positive-type photo resist with surfactant, array board, or semiconductor Organic > 12 Room Temp Undiluted Solution Spray
disperse CO™ Developer for positive-type photo, preventing AI corrosion Organic > 12 Room Temp Undiluted Solution Spray

PRODUCT DESCRIPTION TYPE pH TEMP, °C CONCENTRATION, % USAGE
poleve
927™
Negative-type photo resist for color filter and for rework Inorganic 12 - 14 50°C - 80°C Undiluted Solution US, Dipping, Shower, Brush
poleve
930™
Negative-type photo resist for color filter and for rework Inorganic 12 - 14 50°C - 80°C Undiluted Solution US, Dipping, Shower, Brush
poleve
458™
Positive-type photo resist stripper for color filter, array board Organic
Solvent
N/A 50°C - 80°C Undiluted Solution US, Dipping, Shower
poleve
496™
Positive-type photo resist stripper for array board or semiconductor Organic
Semi-Aqua
12 - 14 50°C - 80°C Undiluted Solution Dipping, Shower
poleve
517™
Positive-type photo resist stripper for array board Organic
Semi-Aqua
12 - 14 50°C - 80°C Undiluted Solution Dipping, Shower
poleve
720™
Positive-type photo resist stripper for array board or semiconductor Organic
Aqua
12 - 14 50°C - 80°C Undiluted Solution Dipping, Shower

PRODUCT DESCRIPTION TYPE pH TEMP, °C CONCENTRATION, % USAGE
allpass
7750™
Cleaner for after liquid crystal injection Semi-Aqua Neutral 40°C - 60°C Undiluted Solution Ultrasonic Dipping, Water
Flushing
allpass
WS-HG™
Cleaner for after liquid crystal injection and particle Water Neutral 40°C - 60°C Undiluted Solution Ultrasonic Dipping, Water
Flushing
kaltfin
20™
Cleaner after liquid crystal injection Solvent Neutral Room Temp -
40°C
Concentrated Solution